Rebirth of mask process correction for better wafer lithography

24.07. 2013 Solid State Technology

Who knew that mask process correction (MPC) would again become necessary for the manufacturing of deep ultraviolet (DUV) photomasks?

Noise cancellation: The new Failure and Yield Analysis Superpower

25.06. 2013 Solid State Technology

With 22nm FinFET-powered laptops now available and foundries announcing timelines for single-digit manufacturing nodes, it’s clear not everybody got the memo declaring Moore’s law dead and obsolete.